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本文考察在径向电子数密度呈抛物形分布的情况下，外加稳恒磁场，射频通过螺旋波天线在等离子体中激发电磁波的传播性质. 采用线性扰动波假设，数值求解Maxwell方程组，得到80–800 G（1 G = 10-4 T）磁场条件下等离子体中径向电、磁场强度及能量沉积密度的分布情形. 计算结果表明，磁场增大（80→800 G）时，螺旋波受到的阻尼较小，可深入等离子体传播；Trivelpiece-Gould（TG）波受到的阻尼增大，在等离子体-真空边界处衰减增强；整体的能量吸收向边界集中. 磁感应强度小于100 G 时，TG 波可深入主等离子体区传播，等离子体径向能量吸收相对均匀.The propagation properties of electromagnetic waves excited by helicon antenna with a parabolic radial electron density distribution in an external magnetic field were studied. Maxwell equations are numerically solved using the linear disturbance wave assumption to obtain energy distribution, when the magnetic intensity changes from 80 to 800 G. The radial electromagnetic wave and energy deposition intensity distributions were obtained. Results show that when magnetic intensity grows, the helicon wave is little damped and it can propagate into the bulk plasma; Trivelpiece-Gould (TG) wave is heavily damped at plasma-vacuum interface; the main energy absorption region moves towards the boundary gradually. When the magnetic intensity is lower than 100 G, the TG wave can propagate into the bulk plasma, and the plasma radial energy distribution is relatively uniform.
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Keywords:
- helicon wave /
- plasma /
- magnetic field /
- numerical simulation
[1] Han K, Jiang B H, Ji Y C 2012 Acta Phys. Sin. 61 075209 (in Chinese) [韩轲, 江滨浩, 纪延超 2012 物理学报 61 075209]
[2] Geng S F, Tang D L, Qiu X M 2012 Acta Phys. Sin. 61 075210 (in Chinese) [耿少飞, 唐德礼, 邱孝明 2012 物理学报 61 075210]
[3] Zhang R, Zhang D X, Zhang F, He Z, Wu J J 2013 Acta Phys. Sin. 62 025207 (in Chinese) [张锐, 张代贤, 张帆, 何振, 吴建军 2013 物理学报 62 025207]
[4] Bering E A, Brukardt M 2006 AIAA Aerospace Science Meeting and Exhibit 766
[5] Feldman M S, Choueiri E Y 2011 Internation Electric Propulsion Conference 220
[6] Toki K, Shinohara S, Tanikawa T, Shamrai K P 2006 Thin Solid Films 506–507 597
[7] Chen F F 2008 IEEE Trans. Plasma Sci. 36 2095
[8] Boswell R W 1984 Plasma Phys. Contr. Fusion 26 1147
[9] Chen F F 1991 Plasma Phys. Contr. Fusion 33 339
[10] Shamrai K P, Taranov V B 1994 Plasma Phys. Contr. Fusion 36 1719
[11] Shamrai K P, Taranov V B 1996 Plasma Sources Sci. Technol. 5 474
[12] Arnush D 2000 Phys. Plasmas 7 3042
[13] Arnush D, Chen F F 1998 Phys. Plasmas 5 1239
[14] Curreli D, Chen F F 2011 Phys. Plasmas 18 113501
[15] Gnoffo P A, Gupta R N, Judy L. shinn 1989 NASA Technical Paper
[16] Vahedi V, Surendra M 1995 Com. Phys. Comm. 87 179
[17] Michael D W, Christine C, Boswell R W 2009 J. Phys. D: Appl. Phys. 42 245201
[18] Windisch T, Rahbarnia K, Grulke O, Klinger T 2010 Plasma Sources Sci. Technol. 19 055002
[19] Nakamuara K, Suzuki K, Sugai H 1995 J. Appl. Phys. 34 2152
[20] Blackwell D D, Madziwa T G, Arnush D, Chen F F 2002 Phys. Rev. Lett. 88 145002
[21] Chen F F, Curreli D 2013 Phys. Plasmas 20 057102
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[1] Han K, Jiang B H, Ji Y C 2012 Acta Phys. Sin. 61 075209 (in Chinese) [韩轲, 江滨浩, 纪延超 2012 物理学报 61 075209]
[2] Geng S F, Tang D L, Qiu X M 2012 Acta Phys. Sin. 61 075210 (in Chinese) [耿少飞, 唐德礼, 邱孝明 2012 物理学报 61 075210]
[3] Zhang R, Zhang D X, Zhang F, He Z, Wu J J 2013 Acta Phys. Sin. 62 025207 (in Chinese) [张锐, 张代贤, 张帆, 何振, 吴建军 2013 物理学报 62 025207]
[4] Bering E A, Brukardt M 2006 AIAA Aerospace Science Meeting and Exhibit 766
[5] Feldman M S, Choueiri E Y 2011 Internation Electric Propulsion Conference 220
[6] Toki K, Shinohara S, Tanikawa T, Shamrai K P 2006 Thin Solid Films 506–507 597
[7] Chen F F 2008 IEEE Trans. Plasma Sci. 36 2095
[8] Boswell R W 1984 Plasma Phys. Contr. Fusion 26 1147
[9] Chen F F 1991 Plasma Phys. Contr. Fusion 33 339
[10] Shamrai K P, Taranov V B 1994 Plasma Phys. Contr. Fusion 36 1719
[11] Shamrai K P, Taranov V B 1996 Plasma Sources Sci. Technol. 5 474
[12] Arnush D 2000 Phys. Plasmas 7 3042
[13] Arnush D, Chen F F 1998 Phys. Plasmas 5 1239
[14] Curreli D, Chen F F 2011 Phys. Plasmas 18 113501
[15] Gnoffo P A, Gupta R N, Judy L. shinn 1989 NASA Technical Paper
[16] Vahedi V, Surendra M 1995 Com. Phys. Comm. 87 179
[17] Michael D W, Christine C, Boswell R W 2009 J. Phys. D: Appl. Phys. 42 245201
[18] Windisch T, Rahbarnia K, Grulke O, Klinger T 2010 Plasma Sources Sci. Technol. 19 055002
[19] Nakamuara K, Suzuki K, Sugai H 1995 J. Appl. Phys. 34 2152
[20] Blackwell D D, Madziwa T G, Arnush D, Chen F F 2002 Phys. Rev. Lett. 88 145002
[21] Chen F F, Curreli D 2013 Phys. Plasmas 20 057102
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