搜索

x
中国物理学会期刊

用MOCVD方法制备的n型GaN薄膜紫外光电导

CSTR: 32037.14.aps.50.1800

THE UV PHOTOCONDUCTIVITY OF n-TYPE GaN FILMSDEPOSITED BY MOCVD

CSTR: 32037.14.aps.50.1800
PDF
导出引用
  • 报道了用MOCVD方法制备的非掺杂的和Mg弱掺杂的n型GaN薄膜的紫外光电导特性.结果表明这些n型样品具有显著的紫外光响应,而且光响应弛豫时间也较短.在弱光范围,光响应随光强的变小呈线性减弱,且光响应的弛豫时间变长.

     

    This paper studies the UV photoconductivity for non-doped and weakly Mg doped n-type GaN films deposited by MOCVD. It was observed that these n-type samples have notable UV photoresponse and the relaxation time of the photoresponse is relatively short.In the weak intensity range, the photoresponse decreases linearly with the light intensity and the relaxation time of the photoresponse becomes larger.

     

    目录

    /

    返回文章
    返回