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应用蒙特卡罗(Monte Carlo)方法模拟研究了磁约束Ar放电中的电离,考察了30pd—4kPa气压范围内横向磁场对电离的影响,得到了磁场作用的有效气压范围(低于600Pa)及最佳磁场值的概念。通过分析,对于磁约束放电方式有了进一步的认识,并对这种放电方式在一般离子激光器及溅射型金属激光器中的应用进行了讨论。Ionization in a magnetically confined argon discharge has been studied by the use of a Monte Carlo simulation. Especially, influences of the transverse magnetic field have been investigated for a pressure range of 30 Pa-4 kPa. It is found that the magnetic field acts effectively only in a definite range of pressure( < 600 Pa), and within the range there is an optimum strength for the field. Analyses for the results and consideration of applying the discharge in ion lasers as well as in sputtering-based metal vapor lasers have been given.
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