搜索

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

大气压下绝缘毛细管内等离子体放电及其特性研究

黄文同 李寿哲 王德真 马腾才

引用本文:
Citation:

大气压下绝缘毛细管内等离子体放电及其特性研究

黄文同, 李寿哲, 王德真, 马腾才

Characteristics of the plasma discharge generated in dielectric capillary at atmospheric pressure

Huang Wen-Tong, Li Shou-Zhe, Wang De-Zhen, Ma Teng-Cai
PDF
导出引用
  • 在石英毛细管内利用两个边缘锋利的中空针型电极间的放电形成了63 cm长的大气压弧光等离子体.通过记录放电图片和测量电流-电压特征波形及伏安特性曲线的方法对管内等离子体从反常辉光状态过渡至超长弧光状态的过程做了细致的研究,发现管内等离子体在弧光状态下的电子密度不低于1014 cm-3.另外,还进一步考察了两电极的间距和电源工作频率对放电伏安特性的影响以及通过发射光谱法测得的等离子体气体温度随外加电压的变化规律.当活性气体(氧气)按一定比例混合到氩等离子体中时,通过
    An atmospheric-pressure argon plasma discharge with a length of 63 cm is generated in a quartz capillary by using a pair of hollow needle electrodes. The discharge mode transition from abnormal glow to arc is investigated by means of electrical measurement and optical emission spectroscopy. The effects of the distance between two needle electrodes and the operating frequency of power supply on the voltage-current characteristics are discussed. The plasma electron density was estimated to be the order of 1014 cm-3 in the arc discharge. Moreover, the variation of gas temperature with the applied voltage is also studied, which is closely associated with the power dissipation. Furthermore, in measuring the oxygen atoms generated in argon/oxygen arc plasma discharge by optical actinometry, we found that the amount of oxygen atoms almost does not change with the rise of oxygen concentration.
    • 基金项目: 国家自然科学基金(批准号:50777004,10775026)和教育部留学回国人员科研启动基金(批准号:20071108)资助的课题.
    [1]

    [1]Ni T L, Ding F, Zhu X D, Wen X H, Zhou H Y 2008 Appl. Phys. Lett. 92 241503

    [2]

    [2]Laroussi M, Hynes W, Akan T, Lu X P, Tendero C 2008 IEEE Trans. Plasma Sci. 36 1298

    [3]

    [3]Kim D B, Rhee J K, Gweon B, Moon S Y, Choe W 2007 Appl. Phys. Lett. 91 151502

    [4]

    [4]Li S Z, Lim J P, Uhm H S 2006 Phys. Lett. A 360 304

    [5]

    [5]Qi B, Ren C S, Ma T C, Wang Y N, Wang D Z 2006 Acta Phys. Sin. 55 331 (in Chinese) [齐冰、任春生、马腾才、王友年、王德真 2006 物理学报 55 331]

    [6]

    [6]Anghel S D, Simon A 2007 Plasma Sour. Sci. Technol. 16 B1

    [7]

    [7]Lu X, Xiong Q, Xiong Z, Hu J, Zhou F, Gong W, Xian Y, Zou C, Tang Z, Jiang Z, Pan Y 2009 J. Appl. Phys. 105 043304

    [8]

    [8]Sands B L, Ganguly B N, Tachibana K 2008 Appl. Phys. Lett. 92 151503

    [9]

    [9]Li S Z, Lim J P 2008 Plasma Sci. Technol. 10 61

    [10]

    ]Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504

    [11]

    ]Chen G L, Chen S H, Chen W X, Yang S Z 2008 Chin. Phys. B 18 4568

    [12]

    ]Shin D H, Hong Y C, Uhm H S 2006 IEEE Trans. Plasma Sci. 34 2464

    [13]

    ]Hong Y C, Cho S C, Kim J H, Uhm H S 2007 Phys. Plasmas 14 074502

    [14]

    ]Pointu A M, Ricard A, Odic E, Ganciu M 2008 Plasma Process. Polym. 5 559

    [15]

    ]Yoshiki H, Saito T 2008 J. Vac. Sci. Technol. A 26 338

    [16]

    ]Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502

    [17]

    ]Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Phys. Plasmas 16 073503

    [18]

    ]Hong Y C, Cho S C, Uhm H S 2007 Appl. Phys. Lett. 90 141501

    [19]

    ]Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Appl. Phys. Lett. 94 111501

    [20]

    ]Moon S Y, Choe W 2003 Spectroch. Acta B 58 249

    [21]

    ]Walkup R E, Saenger K L, Selwyn G S 1986 J. Chem. Phys. 84 2668

    [22]

    ]Lieberman M A, Lichtenberg A J 2007 Principles of Plasma Discharges and Materials Processing(Beijing: Science Press) p208 (in Chinese) [力伯曼M A、里登伯格A J 2007 等离子体放电原理与材料处理(中译本)(北京:科学出版社)第208页]

  • [1]

    [1]Ni T L, Ding F, Zhu X D, Wen X H, Zhou H Y 2008 Appl. Phys. Lett. 92 241503

    [2]

    [2]Laroussi M, Hynes W, Akan T, Lu X P, Tendero C 2008 IEEE Trans. Plasma Sci. 36 1298

    [3]

    [3]Kim D B, Rhee J K, Gweon B, Moon S Y, Choe W 2007 Appl. Phys. Lett. 91 151502

    [4]

    [4]Li S Z, Lim J P, Uhm H S 2006 Phys. Lett. A 360 304

    [5]

    [5]Qi B, Ren C S, Ma T C, Wang Y N, Wang D Z 2006 Acta Phys. Sin. 55 331 (in Chinese) [齐冰、任春生、马腾才、王友年、王德真 2006 物理学报 55 331]

    [6]

    [6]Anghel S D, Simon A 2007 Plasma Sour. Sci. Technol. 16 B1

    [7]

    [7]Lu X, Xiong Q, Xiong Z, Hu J, Zhou F, Gong W, Xian Y, Zou C, Tang Z, Jiang Z, Pan Y 2009 J. Appl. Phys. 105 043304

    [8]

    [8]Sands B L, Ganguly B N, Tachibana K 2008 Appl. Phys. Lett. 92 151503

    [9]

    [9]Li S Z, Lim J P 2008 Plasma Sci. Technol. 10 61

    [10]

    ]Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504

    [11]

    ]Chen G L, Chen S H, Chen W X, Yang S Z 2008 Chin. Phys. B 18 4568

    [12]

    ]Shin D H, Hong Y C, Uhm H S 2006 IEEE Trans. Plasma Sci. 34 2464

    [13]

    ]Hong Y C, Cho S C, Kim J H, Uhm H S 2007 Phys. Plasmas 14 074502

    [14]

    ]Pointu A M, Ricard A, Odic E, Ganciu M 2008 Plasma Process. Polym. 5 559

    [15]

    ]Yoshiki H, Saito T 2008 J. Vac. Sci. Technol. A 26 338

    [16]

    ]Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502

    [17]

    ]Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Phys. Plasmas 16 073503

    [18]

    ]Hong Y C, Cho S C, Uhm H S 2007 Appl. Phys. Lett. 90 141501

    [19]

    ]Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Appl. Phys. Lett. 94 111501

    [20]

    ]Moon S Y, Choe W 2003 Spectroch. Acta B 58 249

    [21]

    ]Walkup R E, Saenger K L, Selwyn G S 1986 J. Chem. Phys. 84 2668

    [22]

    ]Lieberman M A, Lichtenberg A J 2007 Principles of Plasma Discharges and Materials Processing(Beijing: Science Press) p208 (in Chinese) [力伯曼M A、里登伯格A J 2007 等离子体放电原理与材料处理(中译本)(北京:科学出版社)第208页]

计量
  • 文章访问数:  7921
  • PDF下载量:  1413
  • 被引次数: 0
出版历程
  • 收稿日期:  2009-06-29
  • 修回日期:  2010-01-07
  • 刊出日期:  2010-03-05

/

返回文章
返回