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非平衡磁控溅射双势阱静电波动及其共振耦合

牟宗信 牟晓东 贾莉 王春 董闯

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非平衡磁控溅射双势阱静电波动及其共振耦合

牟宗信, 牟晓东, 贾莉, 王春, 董闯

Electrostatic oscillation and coupling resonance in double trap of unbalanced magnetron sputtering

Mu Zong-Xin, Mu Xiao-Dong, Jia Li, Wang Chun, Dong Chuang
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  • 非平衡磁控靶表面电场和磁场相互正交构成磁阱结构,磁控靶和与之平行的偏压基片之间形成了另一种势阱结构,等离子体静电波动在这两种势阱结构中形成耦合共振.采用Langmuir探针研究等离子体中参数和浮置电位信号的功率谱密度.典型放电条件下两种势阱结构中的本征频率分别约为30—50 kHz和10—20 kHz,两种势阱条件下根据声驻波共振模式计算的电子温度数值与实验结果相符合.
    The coupling resonance is induced by the plasma electrostatic oscillation in the magnetic trap consisting of the cross-field at the surface of the unbalanced magnetron sputtering target and the potential well composed of the magnetron sputtering target and the opposite bias substrate in parallel. Langmuir probe was used to study the plasma properties and power spectra density (PSD) of the floating potential signals. Under typical discharge conditions, the eigenfrequencies in both traps were respectively in the range of 30—50 kHz or 10—20 kHz, and the electron temperatures in both traps calculated with the acoustic standing wave mode conformed with the experimental results.
    • 基金项目: 国家自然科学基金(批准号:50407015)资助的课题.
    [1]

    Thornton J A 1978 J. Vac. Sci. Technol. A 15 171

    [2]

    Rossnagel S M, Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276

    [3]

    Sheridan T E, Goree J 1989 J. Vac. Sci. Technol. A 7 1014

    [4]

    Martines E, Spolaore M, Tramontin L, Cavazzana R, Serianni G, Zuin M, Antoni V 2001 Phys. Plasmas 8 3042

    [5]

    Bohm D, Gross E P 1949 Phys. Rev. 75 1851

    [6]

    Hoh F C 1962 Rev. Modern Phys. 34 267

    [7]

    Simon A 1963 Phys. Fluids 6 382

    [8]

    Mu Z X, Li G Q, Che D L 2004 Acta Phys. Sin. 53 1994 (in Chinese) [牟宗信、 李国卿、 车德良 2004 物理学报 53 1994]

    [9]

    Mu Z X, Li G Q, Qin F W, Huang K Y, Che D L 2005 Acta Phys. Sin. 54 1378 (in Chinese) [牟宗信、 李国卿、 秦福文、 黄开玉、 车德良 2005 物理学报 54 1378 ]

    [10]

    Brochard F, Gravier E, Bonhomme G 2005 Phys. Plasma 12 1

    [11]

    Bradley J W, Thompson S, Gonzalvo Y A 2001 Plasma Sources Sci. Technol. 10 490

    [12]

    Ma T C, Hu X W, Chen Y H 1988 The Principle of Plasma Physics (Hefei: Chinese Science and Technology University Press) p340 (in Chinese) [马腾才、 胡希伟、 陈银华 1988 等离子体物理 (合肥:中国科技大学出版社) 第340页]

  • [1]

    Thornton J A 1978 J. Vac. Sci. Technol. A 15 171

    [2]

    Rossnagel S M, Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276

    [3]

    Sheridan T E, Goree J 1989 J. Vac. Sci. Technol. A 7 1014

    [4]

    Martines E, Spolaore M, Tramontin L, Cavazzana R, Serianni G, Zuin M, Antoni V 2001 Phys. Plasmas 8 3042

    [5]

    Bohm D, Gross E P 1949 Phys. Rev. 75 1851

    [6]

    Hoh F C 1962 Rev. Modern Phys. 34 267

    [7]

    Simon A 1963 Phys. Fluids 6 382

    [8]

    Mu Z X, Li G Q, Che D L 2004 Acta Phys. Sin. 53 1994 (in Chinese) [牟宗信、 李国卿、 车德良 2004 物理学报 53 1994]

    [9]

    Mu Z X, Li G Q, Qin F W, Huang K Y, Che D L 2005 Acta Phys. Sin. 54 1378 (in Chinese) [牟宗信、 李国卿、 秦福文、 黄开玉、 车德良 2005 物理学报 54 1378 ]

    [10]

    Brochard F, Gravier E, Bonhomme G 2005 Phys. Plasma 12 1

    [11]

    Bradley J W, Thompson S, Gonzalvo Y A 2001 Plasma Sources Sci. Technol. 10 490

    [12]

    Ma T C, Hu X W, Chen Y H 1988 The Principle of Plasma Physics (Hefei: Chinese Science and Technology University Press) p340 (in Chinese) [马腾才、 胡希伟、 陈银华 1988 等离子体物理 (合肥:中国科技大学出版社) 第340页]

计量
  • 文章访问数:  6777
  • PDF下载量:  562
  • 被引次数: 0
出版历程
  • 收稿日期:  2010-01-14
  • 修回日期:  2010-01-31
  • 刊出日期:  2010-05-05

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