Optimization theory and application of epitaxial layer thickness uniformity in vertical MOCVD reaction chamber with multiple MO nozzles

Li Jian-Jun; Cui Yu-Zheng; Fu Cong-Le; Qin Xiao-Wei; Li Yu-Chang; Deng Jun

doi:10.7498/aps.73.20231555

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Li Jian-Jun, Cui Yu-Zheng, Fu Cong-Le, Qin Xiao-Wei, Li Yu-Chang, Deng Jun. Optimization theory and application of epitaxial layer thickness uniformity in vertical MOCVD reaction chamber with multiple MO nozzlesJ. Acta Physica Sinica, 2024, 73(4): 046801. DOI: 10.7498/aps.73.20231555

Citation:

Li Jian-Jun, Cui Yu-Zheng, Fu Cong-Le, Qin Xiao-Wei, Li Yu-Chang, Deng Jun. Optimization theory and application of epitaxial layer thickness uniformity in vertical MOCVD reaction chamber with multiple MO nozzlesJ. Acta Physica Sinica, 2024, 73(4): 046801. DOI: 10.7498/aps.73.20231555

Citation:

Li Jian-Jun, Cui Yu-Zheng, Fu Cong-Le, Qin Xiao-Wei, Li Yu-Chang, Deng Jun. Optimization theory and application of epitaxial layer thickness uniformity in vertical MOCVD reaction chamber with multiple MO nozzlesJ. Acta Physica Sinica, 2024, 73(4): 046801. DOI: 10.7498/aps.73.20231555