Low-temperature rapid preparation of high-performance indium oxide thin films and transistors based on solution technology

Zhang Xue; Kim Bokyung; Lee Hyeonju; Park Jaehoon

doi:10.7498/aps.73.20240082

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Zhang Xue, Kim Bokyung, Lee Hyeonju, Park Jaehoon. Low-temperature rapid preparation of high-performance indium oxide thin films and transistors based on solution technologyJ. Acta Physica Sinica, 2024, 73(9): 096802. DOI: 10.7498/aps.73.20240082

Citation:

Zhang Xue, Kim Bokyung, Lee Hyeonju, Park Jaehoon. Low-temperature rapid preparation of high-performance indium oxide thin films and transistors based on solution technologyJ. Acta Physica Sinica, 2024, 73(9): 096802. DOI: 10.7498/aps.73.20240082

Citation:

Zhang Xue, Kim Bokyung, Lee Hyeonju, Park Jaehoon. Low-temperature rapid preparation of high-performance indium oxide thin films and transistors based on solution technologyJ. Acta Physica Sinica, 2024, 73(9): 096802. DOI: 10.7498/aps.73.20240082