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HE Zhijian, OU Yun, ZOU Daifeng, LIU Yunya. Enhanced tunneling electroresistance through interfacial work function engineering in Al2Te3/In2Se3 ferroelectric tunnel junctionsJ. Acta Physica Sinica, 2026, 75(2): 020704. DOI: 10.7498/aps.75.20251308
Citation: HE Zhijian, OU Yun, ZOU Daifeng, LIU Yunya. Enhanced tunneling electroresistance through interfacial work function engineering in Al2Te3/In2Se3 ferroelectric tunnel junctionsJ. Acta Physica Sinica, 2026, 75(2): 020704. DOI: 10.7498/aps.75.20251308
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Enhanced tunneling electroresistance through interfacial work function engineering in Al2Te3/In2Se3 ferroelectric tunnel junctions

Acta Phys. Sin., 2026, 75(2): 020704.
DOI: 10.7498/aps.75.20251308
CSTR: 32037.14.aps.75.20251308
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