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The design, fabrication and performance of a large area 10000 line/mm metal transmission diffraction gratings for soft X-ray

Shi Pei-Xiong Zhou Hong-Jun Huo Tong-Lin Zhu Xiao-Li Ma Jie Xie Chang-Qing Zhu Wei-Zhong Wu Yan-Qing Guo Zhi Tai Ren-Zhong Xu Hong-Jie

The design, fabrication and performance of a large area 10000 line/mm metal transmission diffraction gratings for soft X-ray

Shi Pei-Xiong, Zhou Hong-Jun, Huo Tong-Lin, Zhu Xiao-Li, Ma Jie, Xie Chang-Qing, Zhu Wei-Zhong, Wu Yan-Qing, Guo Zhi, Tai Ren-Zhong, Xu Hong-Jie
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  • Received Date:  25 February 2008
  • Accepted Date:  21 April 2008
  • Published Online:  05 May 2008

The design, fabrication and performance of a large area 10000 line/mm metal transmission diffraction gratings for soft X-ray

  • 1. (1)丹麦科技大学,哥本哈根 2800; (2)中国科技大学国家同步辐射实验室,合肥 230029; (3)中国科学院微电子研究所,北京 100029; (4)中科院上海应用物理研究所,上海 201800

Abstract: Based on the rigorous coupled-wave analysis, the optimized design for a transmission two-gratings mask for 13.4nm soft X-ray interference lithography has been accomplished. Then a large area transmission gratings was successfully fabricated by electron beam lithography (EBL), which has an area of 1.5mm×1.5mm, ruling period of 100nm, Cr relief thickness of 50nm, gap/period of 0.6, and Si3N4 substrate thickness of 100nm. Based on the quantitative estimation of the measurement data, the first and second order diffraction efficiencies were determined as 4.41% and 0.49%, respectively, in good agreement with the numerical simulation results. Through comparison between the measurement and the numerical simulation results, it was shown that the relief is entirely vertical and the gap/period was well controlled. This two-grating mask will be used installed on the soft X-ray interference lithography endstation at Shanghai Synchrotron Radiation Facility (SSRF). With its 1st and 2nd order diffraction, 50nm period and 25nm period gratings can be cost-effectively fabricated, respectively.

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