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中国物理学会期刊

基于青藏高原的14 nm FinFET和28 nm平面CMOS工艺SRAM单粒子效应实时测量试验

CSTR: 32037.14.aps.72.20230161

Experimental study on real-time measurement of single-event effects of 14 nm FinFET and 28 nm planar CMOS SRAMs based on Qinghai-Tibet Plateau

CSTR: 32037.14.aps.72.20230161
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  • 本文基于海拔为4300 m的拉萨羊八井国际宇宙射线观测站, 开展了14 nm FinFET和28 nm平面互补金属氧化物半导体(complementary metal oxide semiconductor, CMOS)工艺静态随机存取存储器(static random-access memory, SRAM)阵列的大气辐射长期实时测量试验. 试验持续时间为6651 h, 共观测到单粒子翻转(single event upset, SEU)事件56个, 其中单位翻转(single bit upset, SBU) 24个, 多单元翻转(multiple cell upset, MCU) 32个. 结合之前开展的65 nm工艺SRAM结果, 研究发现, 随着工艺尺寸的减小, 器件的整体软错误率(soft error rate, SER)持续降低. 但是, 相比于65和14 nm工艺器件, 28 nm工艺器件的MCU SER最大, 其MCU占比(57%)超过SBU, MCU最大位数为16位. 虽然14 nm FinFET器件的Fin间距仅有35 nm左右, 且临界电荷降至亚fC, 但FinFET结构的引入导致灵敏区电荷收集和共享机制发生变化, 浅沟道隔离致使电荷扩散通道“狭窄化”, 另一方面灵敏区表面积减小至0.0024 μm2, 从而导致14 nm工艺器件SBU和MCU的软错误率均明显下降.

     

    Based on the Yangbajing International Cosmic Ray Observatory in Lhasa with an altitude of 4300 m, a long-term real-time experiment is carried out in order to measure the atmospheric radiation induced soft errors in 14 nm FinFET and 28 nm planar CMOS SRAM array. The underlying mechanisms are also revealed. Five boards are used in the test, four of which are equipped with 28-nm process devices, and one board is equipped with 14-nm process devices. After removing the unstable bad bits, the actual effective test capacity is 7.1 Gb. During the test, the on-board FPGA reads the stored contents of all the tested devices in real time, reports the error information (occurrence time, board number, column number, device number, error address, error data) and corrects the error. The duration of the test is 6651 h. A total of 56 single event upset (SEU) events are observed, they being 24 single bit upset (SBU) events and 32 Multiple Cell Upset (MCU) events. Based on previous results of 65-nm SRAM, the study finds that SER continues to decrease with the reduction of process size, but the proportion of MCU in 28-nm process devices (57%) exceeds SBU, which is a process “maximum point” of MCU sensitivity, and the maximum size of MCU is 16 bits. Although the Fin spacing of the 14-nm FinFET device is only about 35 nm, and the critical charge decreases to sub-fC, the introduction of the FinFET structure leads to the change of charge collection and the sensitive volume sharing mechanism , and the shallow trench isolation leads to the narrowing of the charge diffusion channel. On the other hand, the surface area of the sensitive volume decreases to 0.0024 μm2, resulting in a significant decrease in the soft error rate of both SBU and MCU in the 14-nm process.

     

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