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中国物理学会期刊

MoS2/MoTe2垂直异质结的电荷传输及其调制

CSTR: 32037.14.aps.72.20221768

Charge transmission of MoS2/MoTe2 vertical heterojunction and its modulation

CSTR: 32037.14.aps.72.20221768
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  • 二维材料异质结器件具有纳米级厚度及范德瓦耳斯接触表面, 因而表现出独特的光电特性. 本文构建了栅压可调的MoS2/MoTe2垂直异质结器件, 利用开尔文探针力显微镜(KPFM)技术结合电输运测量, 揭示了MoS2/MoTe2异质结分别在黑暗和532 nm激光照射条件下的电荷输运行为, 发现随着栅压的变化异质结表现出从n-n+结到p-n结的反双极性特征. 系统地解释了MoS2/MoTe2异质结的电荷输运机制, 包括n-n+结和p-n结在正偏和反偏下条件下的电荷输运过程、随栅压变化而发生的转变的结区行为、接触势垒对电荷输运的影响、n-n+结和p-n结具有不同整流特征的原因、偏压对带间隧穿的重要作用及光生载流子对电学输运行为的影响等. 本文所使用的方法可推广到其他二维异质结体系, 为提高二维半导体器件性能及其应用提供了重要的参考和借鉴.

     

    The heterojunction device based on two-dimensional materials possesses unique photoelectric properties due to its nanoscale thickness and van der Waals (vdWs) contact surface. In this paper, a gate-voltage-tunable MoS2/MoTe2 vertical vdWs heterojunction device is constructed. The Kelvin probe force microscopy (KPFM) technology is combined with the electric transport measurement technology, thereby revealing the charge transport behavior of the MoS2/MoTe2 heterojunction under dark condition and laser-irradition condition, including the bipolarity characteristics of the transition from n-n+ junction to p-n junction. In this paper, the charge transport mechanism of heterojunction is explained comprehensively and systematically, including the charge transmission process of n-n+ junction and p-n junction under positive and negative bias conditions, the transformation of nodule behavior with gate voltage, the influence of barriers on charge transmission, the different rectification characteristics between n-n+ junction and p-n junction, the major role of source and leakage bias voltage in band tunneling, and the influence of photogenerated carriers on electrical transmission. The method in this work can be generalized to other two-dimensional heterojunction systems and also provide an important reference for improving the performance of two-dimensional semiconductor devices and their applications in the future.

     

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