1999, 48(3): 385-388.
DOI: 10.7498/aps.48.385
CSTR: 32037.14.aps.48.385
1999, 48(3): 389-394.
DOI: 10.7498/aps.48.389
CSTR: 32037.14.aps.48.389
1999, 48(3): 395-401.
DOI: 10.7498/aps.48.395
CSTR: 32037.14.aps.48.395
1999, 48(3): 402-407.
DOI: 10.7498/aps.48.402
CSTR: 32037.14.aps.48.402
1999, 48(3): 416-420.
DOI: 10.7498/aps.48.416
CSTR: 32037.14.aps.48.416
1999, 48(3): 421-425.
DOI: 10.7498/aps.48.421
CSTR: 32037.14.aps.48.421
1999, 48(3): 426-432.
DOI: 10.7498/aps.48.426
CSTR: 32037.14.aps.48.426
1999, 48(3): 433-437.
DOI: 10.7498/aps.48.433
CSTR: 32037.14.aps.48.433
1999, 48(3): 438-445.
DOI: 10.7498/aps.48.438
CSTR: 32037.14.aps.48.438
1999, 48(3): 453-460.
DOI: 10.7498/aps.48.453
CSTR: 32037.14.aps.48.453
1999, 48(3): 461-467.
DOI: 10.7498/aps.48.461
CSTR: 32037.14.aps.48.461
1999, 48(3): 468-473.
DOI: 10.7498/aps.48.468
CSTR: 32037.14.aps.48.468
INFLUENCE OF PHOTOSENSITIZER IN LOW GLASS TRANSITION TEMPERATURE PHOTOREFRACTIVE POLYMERIC COMPOSITE
1999, 48(3): 474-479.
DOI: 10.7498/aps.48.474
CSTR: 32037.14.aps.48.474
1999, 48(3): 480-484.
DOI: 10.7498/aps.48.480
CSTR: 32037.14.aps.48.480
1999, 48(3): 485-490.
DOI: 10.7498/aps.48.485
CSTR: 32037.14.aps.48.485
1999, 48(3): 491-496.
DOI: 10.7498/aps.48.491
CSTR: 32037.14.aps.48.491
1999, 48(3): 497-504.
DOI: 10.7498/aps.48.497
CSTR: 32037.14.aps.48.497
1999, 48(3): 505-510.
DOI: 10.7498/aps.48.505
CSTR: 32037.14.aps.48.505
1999, 48(3): 511-519.
DOI: 10.7498/aps.48.511
CSTR: 32037.14.aps.48.511
1999, 48(3): 520-526.
DOI: 10.7498/aps.48.520
CSTR: 32037.14.aps.48.520
1999, 48(3): 527-532.
DOI: 10.7498/aps.48.527
CSTR: 32037.14.aps.48.527
1999, 48(3): 533-538.
DOI: 10.7498/aps.48.533
CSTR: 32037.14.aps.48.533
1999, 48(3): 539-544.
DOI: 10.7498/aps.48.539
CSTR: 32037.14.aps.48.539
1999, 48(3): 545-549.
DOI: 10.7498/aps.48.545
CSTR: 32037.14.aps.48.545
1999, 48(3): 550-555.
DOI: 10.7498/aps.48.550
CSTR: 32037.14.aps.48.550
1999, 48(3): 556-560.
DOI: 10.7498/aps.48.556
CSTR: 32037.14.aps.48.556


