MEASUREMENT OF THE THICKNESS OF THERMALLY GROWN SiO<sub>2</sub> THIN FILMS

SHIN SHIH-KONG; HUANG CHAANG; YU FUNG-SHU

doi:10.7498/aps.20.654

SHIN SHIH-KONG, HUANG CHAANG, YU FUNG-SHU. MEASUREMENT OF THE THICKNESS OF THERMALLY GROWN SiO2 THIN FILMSJ. Acta Physica Sinica, 1964, 20(7): 654-661. DOI: 10.7498/aps.20.654

Citation:

SHIN SHIH-KONG, HUANG CHAANG, YU FUNG-SHU. MEASUREMENT OF THE THICKNESS OF THERMALLY GROWN SiO2 THIN FILMSJ. Acta Physica Sinica, 1964, 20(7): 654-661. DOI: 10.7498/aps.20.654

Citation:

SHIN SHIH-KONG, HUANG CHAANG, YU FUNG-SHU. MEASUREMENT OF THE THICKNESS OF THERMALLY GROWN SiO2 THIN FILMSJ. Acta Physica Sinica, 1964, 20(7): 654-661. DOI: 10.7498/aps.20.654