DIFFUSION OF PHOSPHORUS INTO SILICON THROUGH SILICON DIOXIDE FILM GROWN BY THERMAL OXIDATION

CHEN CHEN-CHIA; YOUNG CHENG-CHING; HUANG HENG-CHI

doi:10.7498/aps.20.662

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CHEN CHEN-CHIA, YOUNG CHENG-CHING, HUANG HENG-CHI. DIFFUSION OF PHOSPHORUS INTO SILICON THROUGH SILICON DIOXIDE FILM GROWN BY THERMAL OXIDATIONJ. Acta Physica Sinica, 1964, 20(7): 662-669. DOI: 10.7498/aps.20.662

Citation:

CHEN CHEN-CHIA, YOUNG CHENG-CHING, HUANG HENG-CHI. DIFFUSION OF PHOSPHORUS INTO SILICON THROUGH SILICON DIOXIDE FILM GROWN BY THERMAL OXIDATIONJ. Acta Physica Sinica, 1964, 20(7): 662-669. DOI: 10.7498/aps.20.662

Citation:

CHEN CHEN-CHIA, YOUNG CHENG-CHING, HUANG HENG-CHI. DIFFUSION OF PHOSPHORUS INTO SILICON THROUGH SILICON DIOXIDE FILM GROWN BY THERMAL OXIDATIONJ. Acta Physica Sinica, 1964, 20(7): 662-669. DOI: 10.7498/aps.20.662