IN-DEPTH OXYGEN CONTAMINATION PRODUCED IN CW CO2 LASER ANNEALED Si

XU ZHEN-JIA; CHEN WEI-DE

doi:10.7498/aps.33.9

XU ZHEN-JIA, CHEN WEI-DE. IN-DEPTH OXYGEN CONTAMINATION PRODUCED IN CW CO2 LASER ANNEALED SiJ. Acta Physica Sinica, 1984, 33(1): 9-15. DOI: 10.7498/aps.33.9

Citation:

XU ZHEN-JIA, CHEN WEI-DE. IN-DEPTH OXYGEN CONTAMINATION PRODUCED IN CW CO2 LASER ANNEALED SiJ. Acta Physica Sinica, 1984, 33(1): 9-15. DOI: 10.7498/aps.33.9

Citation:

XU ZHEN-JIA, CHEN WEI-DE. IN-DEPTH OXYGEN CONTAMINATION PRODUCED IN CW CO2 LASER ANNEALED SiJ. Acta Physica Sinica, 1984, 33(1): 9-15. DOI: 10.7498/aps.33.9