ANNEALING PROPERTIES OF GOLD-DOPED AND UNDOPED Si-SiO2 INTERFACES IN DRY OXYGEN

LI SI-YUAN; ZHANG TONG-JUN; WANG IU-ZHEN; LI SHOU-SONG; YIN ZHI-PING

doi:10.7498/aps.34.715

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LI SI-YUAN, ZHANG TONG-JUN, WANG IU-ZHEN, LI SHOU-SONG, YIN ZHI-PING. ANNEALING PROPERTIES OF GOLD-DOPED AND UNDOPED Si-SiO2 INTERFACES IN DRY OXYGENJ. Acta Physica Sinica, 1985, 34(6): 715-724. DOI: 10.7498/aps.34.715

Citation:

LI SI-YUAN, ZHANG TONG-JUN, WANG IU-ZHEN, LI SHOU-SONG, YIN ZHI-PING. ANNEALING PROPERTIES OF GOLD-DOPED AND UNDOPED Si-SiO2 INTERFACES IN DRY OXYGENJ. Acta Physica Sinica, 1985, 34(6): 715-724. DOI: 10.7498/aps.34.715

Citation:

LI SI-YUAN, ZHANG TONG-JUN, WANG IU-ZHEN, LI SHOU-SONG, YIN ZHI-PING. ANNEALING PROPERTIES OF GOLD-DOPED AND UNDOPED Si-SiO2 INTERFACES IN DRY OXYGENJ. Acta Physica Sinica, 1985, 34(6): 715-724. DOI: 10.7498/aps.34.715