A STUDY OF DAMAGE IN SILICON CREATED BY P2+ IMPLANTATION

FANG ZI-WEI; LIN CHENG-LU; ZOU SHI-CHANG

doi:10.7498/aps.37.1425

FANG ZI-WEI, LIN CHENG-LU, ZOU SHI-CHANG. A STUDY OF DAMAGE IN SILICON CREATED BY P2+ IMPLANTATIONJ. Acta Physica Sinica, 1988, 37(9): 1425-1431. DOI: 10.7498/aps.37.1425

Citation:

FANG ZI-WEI, LIN CHENG-LU, ZOU SHI-CHANG. A STUDY OF DAMAGE IN SILICON CREATED BY P2+ IMPLANTATIONJ. Acta Physica Sinica, 1988, 37(9): 1425-1431. DOI: 10.7498/aps.37.1425

Citation:

FANG ZI-WEI, LIN CHENG-LU, ZOU SHI-CHANG. A STUDY OF DAMAGE IN SILICON CREATED BY P2+ IMPLANTATIONJ. Acta Physica Sinica, 1988, 37(9): 1425-1431. DOI: 10.7498/aps.37.1425