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中国物理学会期刊
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QI MING, LUO JIN-SHENG. A STUDY ON THE PROPERTIES OF SiO2 THIN FILM THERMALLY NITRIDED IN AMMONIA AND ITS INTERFACEJ. Acta Physica Sinica, 1988, 37(10): 1600-1606. DOI: 10.7498/aps.37.1600
Citation: QI MING, LUO JIN-SHENG. A STUDY ON THE PROPERTIES OF SiO2 THIN FILM THERMALLY NITRIDED IN AMMONIA AND ITS INTERFACEJ. Acta Physica Sinica, 1988, 37(10): 1600-1606. DOI: 10.7498/aps.37.1600
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A STUDY ON THE PROPERTIES OF SiO2 THIN FILM THERMALLY NITRIDED IN AMMONIA AND ITS INTERFACE

Acta Phys. Sin., 1988, 37(10): 1600-1606.
DOI: 10.7498/aps.37.1600
CSTR: 32037.14.aps.37.1600
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