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中国物理学会期刊
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X-RAY DIFFRACTION INVESTIGATION FOR ANNEALING OF Co-SPUTTERED W-Si FILMS ON S10_2_J. Acta Physica Sinica, 1989, 38(8): 1379-1383. DOI: 10.7498/aps.38.1379
Citation: X-RAY DIFFRACTION INVESTIGATION FOR ANNEALING OF Co-SPUTTERED W-Si FILMS ON S10_2_J. Acta Physica Sinica, 1989, 38(8): 1379-1383. DOI: 10.7498/aps.38.1379
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X-RAY DIFFRACTION INVESTIGATION FOR ANNEALING OF Co-SPUTTERED W-Si FILMS ON S10_2_

Acta Phys. Sin., 1989, 38(8): 1379-1383.
DOI: 10.7498/aps.38.1379
CSTR: 32037.14.aps.38.1379
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