BREAKDOWN CHARACTERISTICS OF RAPID THERMAL NITRIDED SiO2 FILM OF 150? THICKNESS

LIU ZHI-HONG; CHEN PU-SHENG; LIU BAI-YONG; CHENG YAO-ZONG

doi:10.7498/aps.40.154

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LIU ZHI-HONG, CHEN PU-SHENG, LIU BAI-YONG, CHENG YAO-ZONG. BREAKDOWN CHARACTERISTICS OF RAPID THERMAL NITRIDED SiO2 FILM OF 150? THICKNESSJ. Acta Physica Sinica, 1991, 40(1): 154-160. DOI: 10.7498/aps.40.154

Citation:

LIU ZHI-HONG, CHEN PU-SHENG, LIU BAI-YONG, CHENG YAO-ZONG. BREAKDOWN CHARACTERISTICS OF RAPID THERMAL NITRIDED SiO2 FILM OF 150? THICKNESSJ. Acta Physica Sinica, 1991, 40(1): 154-160. DOI: 10.7498/aps.40.154

Citation:

LIU ZHI-HONG, CHEN PU-SHENG, LIU BAI-YONG, CHENG YAO-ZONG. BREAKDOWN CHARACTERISTICS OF RAPID THERMAL NITRIDED SiO2 FILM OF 150? THICKNESSJ. Acta Physica Sinica, 1991, 40(1): 154-160. DOI: 10.7498/aps.40.154