X-RAY DOUBLE-CRYSTAL DIFFRACTION STUDY OF HIGH QUALITY GexSi1-x/Si STRAINED LAYER SUPERLATTICE

TIAN LIANG-GUANG; ZHU NAN-CHANG; CHEN JING-YI; LI RUN-SHEN; XU SHUN-SHENG; ZHOU GUO-LIANG

doi:10.7498/aps.40.441

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TIAN LIANG-GUANG, ZHU NAN-CHANG, CHEN JING-YI, LI RUN-SHEN, XU SHUN-SHENG, ZHOU GUO-LIANG. X-RAY DOUBLE-CRYSTAL DIFFRACTION STUDY OF HIGH QUALITY GexSi1-x/Si STRAINED LAYER SUPERLATTICEJ. Acta Physica Sinica, 1991, 40(3): 441-448. DOI: 10.7498/aps.40.441

Citation:

TIAN LIANG-GUANG, ZHU NAN-CHANG, CHEN JING-YI, LI RUN-SHEN, XU SHUN-SHENG, ZHOU GUO-LIANG. X-RAY DOUBLE-CRYSTAL DIFFRACTION STUDY OF HIGH QUALITY GexSi1-x/Si STRAINED LAYER SUPERLATTICEJ. Acta Physica Sinica, 1991, 40(3): 441-448. DOI: 10.7498/aps.40.441

Citation:

TIAN LIANG-GUANG, ZHU NAN-CHANG, CHEN JING-YI, LI RUN-SHEN, XU SHUN-SHENG, ZHOU GUO-LIANG. X-RAY DOUBLE-CRYSTAL DIFFRACTION STUDY OF HIGH QUALITY GexSi1-x/Si STRAINED LAYER SUPERLATTICEJ. Acta Physica Sinica, 1991, 40(3): 441-448. DOI: 10.7498/aps.40.441