A STUDY ON DISSOCIATION KINETICS OF SiH4+CH4 PLASMA INDUCED BY PULSED INFRARED LASER

YU WEI; LI XIAO-WEI; HAN LI; ZHANG LIAN-SHUI; FU GUANG-SHENG

doi:10.7498/aps.43.1889

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YU WEI, LI XIAO-WEI, HAN LI, ZHANG LIAN-SHUI, FU GUANG-SHENG. A STUDY ON DISSOCIATION KINETICS OF SiH4+CH4 PLASMA INDUCED BY PULSED INFRARED LASERJ. Acta Physica Sinica, 1994, 43(11): 1889-1898. DOI: 10.7498/aps.43.1889

Citation:

YU WEI, LI XIAO-WEI, HAN LI, ZHANG LIAN-SHUI, FU GUANG-SHENG. A STUDY ON DISSOCIATION KINETICS OF SiH4+CH4 PLASMA INDUCED BY PULSED INFRARED LASERJ. Acta Physica Sinica, 1994, 43(11): 1889-1898. DOI: 10.7498/aps.43.1889

Citation:

YU WEI, LI XIAO-WEI, HAN LI, ZHANG LIAN-SHUI, FU GUANG-SHENG. A STUDY ON DISSOCIATION KINETICS OF SiH4+CH4 PLASMA INDUCED BY PULSED INFRARED LASERJ. Acta Physica Sinica, 1994, 43(11): 1889-1898. DOI: 10.7498/aps.43.1889