SIMS ANALYSIS OF MIGRATION CHARACTERISTICS OF FLUORINE IN BF2+ IMPLANTED POLY-Si GATE UNDER CONVENTIONAL THERMAL ANNEALING

LIU JIA-LU; ZHANG TING-QING; LI JIAN-JUN; ZHAO YUAN-FU

doi:10.7498/aps.46.1580

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LIU JIA-LU, ZHANG TING-QING, LI JIAN-JUN, ZHAO YUAN-FU. SIMS ANALYSIS OF MIGRATION CHARACTERISTICS OF FLUORINE IN BF2+ IMPLANTED POLY-Si GATE UNDER CONVENTIONAL THERMAL ANNEALINGJ. Acta Physica Sinica, 1997, 46(8): 1580-1584. DOI: 10.7498/aps.46.1580

Citation:

LIU JIA-LU, ZHANG TING-QING, LI JIAN-JUN, ZHAO YUAN-FU. SIMS ANALYSIS OF MIGRATION CHARACTERISTICS OF FLUORINE IN BF2+ IMPLANTED POLY-Si GATE UNDER CONVENTIONAL THERMAL ANNEALINGJ. Acta Physica Sinica, 1997, 46(8): 1580-1584. DOI: 10.7498/aps.46.1580

Citation:

LIU JIA-LU, ZHANG TING-QING, LI JIAN-JUN, ZHAO YUAN-FU. SIMS ANALYSIS OF MIGRATION CHARACTERISTICS OF FLUORINE IN BF2+ IMPLANTED POLY-Si GATE UNDER CONVENTIONAL THERMAL ANNEALINGJ. Acta Physica Sinica, 1997, 46(8): 1580-1584. DOI: 10.7498/aps.46.1580