LIU XIAO-BING, XIONG ZU-HONG, YUAN SHUAI, LIAO LIANG-SHENG, HE JUN, CAO XIAN-AN, MIAO XI-YUE, DING XUN-MIN, HOU XIAO-YUAN. A NEW METHOD FOR POST TREATMENT OF POROUS SILICON:SULFUR PASSIVATION BY MICROWAVE PLASMA ASSISTANCEJ. Acta Physica Sinica, 1997, 46(10): 2059-2065. DOI: 10.7498/aps.46.2059
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Citation:
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LIU XIAO-BING, XIONG ZU-HONG, YUAN SHUAI, LIAO LIANG-SHENG, HE JUN, CAO XIAN-AN, MIAO XI-YUE, DING XUN-MIN, HOU XIAO-YUAN. A NEW METHOD FOR POST TREATMENT OF POROUS SILICON:SULFUR PASSIVATION BY MICROWAVE PLASMA ASSISTANCEJ. Acta Physica Sinica, 1997, 46(10): 2059-2065. DOI: 10.7498/aps.46.2059
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LIU XIAO-BING, XIONG ZU-HONG, YUAN SHUAI, LIAO LIANG-SHENG, HE JUN, CAO XIAN-AN, MIAO XI-YUE, DING XUN-MIN, HOU XIAO-YUAN. A NEW METHOD FOR POST TREATMENT OF POROUS SILICON:SULFUR PASSIVATION BY MICROWAVE PLASMA ASSISTANCEJ. Acta Physica Sinica, 1997, 46(10): 2059-2065. DOI: 10.7498/aps.46.2059
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Citation:
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LIU XIAO-BING, XIONG ZU-HONG, YUAN SHUAI, LIAO LIANG-SHENG, HE JUN, CAO XIAN-AN, MIAO XI-YUE, DING XUN-MIN, HOU XIAO-YUAN. A NEW METHOD FOR POST TREATMENT OF POROUS SILICON:SULFUR PASSIVATION BY MICROWAVE PLASMA ASSISTANCEJ. Acta Physica Sinica, 1997, 46(10): 2059-2065. DOI: 10.7498/aps.46.2059
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