PREPARATION OF CUBIC C3N4 THIN FILMS BY LOW-PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

ZHANG ZHI-HONG; GUO HUAI-XI; YU FEI-WEI; XIONG QI-HUA; YE MING-SHENG; FAN XIANG-JUN

doi:10.7498/aps.47.1047

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ZHANG ZHI-HONG, GUO HUAI-XI, YU FEI-WEI, XIONG QI-HUA, YE MING-SHENG, FAN XIANG-JUN. PREPARATION OF CUBIC C3N4 THIN FILMS BY LOW-PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 1998, 47(6): 1047-1051. DOI: 10.7498/aps.47.1047

Citation:

ZHANG ZHI-HONG, GUO HUAI-XI, YU FEI-WEI, XIONG QI-HUA, YE MING-SHENG, FAN XIANG-JUN. PREPARATION OF CUBIC C3N4 THIN FILMS BY LOW-PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 1998, 47(6): 1047-1051. DOI: 10.7498/aps.47.1047

Citation:

ZHANG ZHI-HONG, GUO HUAI-XI, YU FEI-WEI, XIONG QI-HUA, YE MING-SHENG, FAN XIANG-JUN. PREPARATION OF CUBIC C3N4 THIN FILMS BY LOW-PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 1998, 47(6): 1047-1051. DOI: 10.7498/aps.47.1047