ANALYSIS AND SIMULATION OF FLUORINE MIGRATION CHARACTERISTICS OF BF+2-IMPLANTED INTO  POLYCRYSTALLINE SILICON GATE

ZHANG TING-QING; LI JIAN-JUN; LIU JIA-LU; ZHAO YUAN-FU

doi:10.7498/aps.47.645

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ZHANG TING-QING, LI JIAN-JUN, LIU JIA-LU, ZHAO YUAN-FU. ANALYSIS AND SIMULATION OF FLUORINE MIGRATION CHARACTERISTICS OF BF+2-IMPLANTED INTO POLYCRYSTALLINE SILICON GATEJ. Acta Physica Sinica, 1998, 47(4): 645-651. DOI: 10.7498/aps.47.645

Citation:

ZHANG TING-QING, LI JIAN-JUN, LIU JIA-LU, ZHAO YUAN-FU. ANALYSIS AND SIMULATION OF FLUORINE MIGRATION CHARACTERISTICS OF BF+2-IMPLANTED INTO POLYCRYSTALLINE SILICON GATEJ. Acta Physica Sinica, 1998, 47(4): 645-651. DOI: 10.7498/aps.47.645

Citation:

ZHANG TING-QING, LI JIAN-JUN, LIU JIA-LU, ZHAO YUAN-FU. ANALYSIS AND SIMULATION OF FLUORINE MIGRATION CHARACTERISTICS OF BF+2-IMPLANTED INTO POLYCRYSTALLINE SILICON GATEJ. Acta Physica Sinica, 1998, 47(4): 645-651. DOI: 10.7498/aps.47.645