INVESTIGATION ON THE DEPOSITION PROCESS OF SILICON NITRIDE THIN FILM PREPARED BY ECR-PECVD

CHEN JUN-FANG; WU XIAN-QIU; WANG DE-QIU; DING ZHEN-FENG; REN ZHAO-XING

doi:10.7498/aps.48.1309

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CHEN JUN-FANG, WU XIAN-QIU, WANG DE-QIU, DING ZHEN-FENG, REN ZHAO-XING. INVESTIGATION ON THE DEPOSITION PROCESS OF SILICON NITRIDE THIN FILM PREPARED BY ECR-PECVDJ. Acta Physica Sinica, 1999, 48(7): 1309-1314. DOI: 10.7498/aps.48.1309

Citation:

CHEN JUN-FANG, WU XIAN-QIU, WANG DE-QIU, DING ZHEN-FENG, REN ZHAO-XING. INVESTIGATION ON THE DEPOSITION PROCESS OF SILICON NITRIDE THIN FILM PREPARED BY ECR-PECVDJ. Acta Physica Sinica, 1999, 48(7): 1309-1314. DOI: 10.7498/aps.48.1309

Citation:

CHEN JUN-FANG, WU XIAN-QIU, WANG DE-QIU, DING ZHEN-FENG, REN ZHAO-XING. INVESTIGATION ON THE DEPOSITION PROCESS OF SILICON NITRIDE THIN FILM PREPARED BY ECR-PECVDJ. Acta Physica Sinica, 1999, 48(7): 1309-1314. DOI: 10.7498/aps.48.1309