THE MICROSTRUCTURE AND ITS HIGH-TEMPERATURE   ANNEALING BEHAVIOURS OF a-Si∶O∶H FILM

WANG YONG-QIAN; CHEN CHANG-YONG; CHEN WEI-DE; YANG FU-HUA; DIAO HONG-WEI; XU ZHEN-JIA; ZHANG SHI-BIN; KONG GUANG-LIN; LIAO XIAN-BO

doi:10.7498/aps.50.2418

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WANG YONG-QIAN, CHEN CHANG-YONG, CHEN WEI-DE, YANG FU-HUA, DIAO HONG-WEI, XU ZHEN-JIA, ZHANG SHI-BIN, KONG GUANG-LIN, LIAO XIAN-BO. THE MICROSTRUCTURE AND ITS HIGH-TEMPERATURE ANNEALING BEHAVIOURS OF a-Si∶O∶H FILMJ. Acta Physica Sinica, 2001, 50(12): 2418-2422. DOI: 10.7498/aps.50.2418

Citation:

WANG YONG-QIAN, CHEN CHANG-YONG, CHEN WEI-DE, YANG FU-HUA, DIAO HONG-WEI, XU ZHEN-JIA, ZHANG SHI-BIN, KONG GUANG-LIN, LIAO XIAN-BO. THE MICROSTRUCTURE AND ITS HIGH-TEMPERATURE ANNEALING BEHAVIOURS OF a-Si∶O∶H FILMJ. Acta Physica Sinica, 2001, 50(12): 2418-2422. DOI: 10.7498/aps.50.2418

Citation:

WANG YONG-QIAN, CHEN CHANG-YONG, CHEN WEI-DE, YANG FU-HUA, DIAO HONG-WEI, XU ZHEN-JIA, ZHANG SHI-BIN, KONG GUANG-LIN, LIAO XIAN-BO. THE MICROSTRUCTURE AND ITS HIGH-TEMPERATURE ANNEALING BEHAVIOURS OF a-Si∶O∶H FILMJ. Acta Physica Sinica, 2001, 50(12): 2418-2422. DOI: 10.7498/aps.50.2418