CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION

NING ZHAO-YUAN; CHENG SHAN-HUA; YE CHAO

doi:10.7498/aps.50.566

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NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO. CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 2001, 50(3): 566-571. DOI: 10.7498/aps.50.566

Citation:

NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO. CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 2001, 50(3): 566-571. DOI: 10.7498/aps.50.566

Citation:

NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO. CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 2001, 50(3): 566-571. DOI: 10.7498/aps.50.566