Plasma source ion implantation near the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulses

Liu Cheng Sen; Wang De Zhen

doi:10.7498/aps.52.109

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Liu Cheng Sen, Wang De Zhen. Plasma source ion implantation near the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulsesJ. Acta Physica Sinica, 2003, 52(1): 109-114. DOI: 10.7498/aps.52.109

Citation:

Liu Cheng Sen, Wang De Zhen. Plasma source ion implantation near the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulsesJ. Acta Physica Sinica, 2003, 52(1): 109-114. DOI: 10.7498/aps.52.109

Citation:

Liu Cheng Sen, Wang De Zhen. Plasma source ion implantation near the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulsesJ. Acta Physica Sinica, 2003, 52(1): 109-114. DOI: 10.7498/aps.52.109