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中国物理学会期刊
Wang Yuan, Zhang Yi-Men, Zhang Yu-Ming, Tang Xiao-Yan. A simulation study of 6H-SiC Schottky barrier source/drain MOSFETJ. Acta Physica Sinica, 2003, 52(10): 2553-2557. DOI: 10.7498/aps.52.2553
Citation: Wang Yuan, Zhang Yi-Men, Zhang Yu-Ming, Tang Xiao-Yan. A simulation study of 6H-SiC Schottky barrier source/drain MOSFETJ. Acta Physica Sinica, 2003, 52(10): 2553-2557. DOI: 10.7498/aps.52.2553

A simulation study of 6H-SiC Schottky barrier source/drain MOSFET

CSTR: 32037.14.aps.52.2553
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