In-situ monitoring of the growth of oxide thin films in PLD using high-pressure  reflection high energy electron diffraction

Chen Ying-Fei; Peng Wei; Li Jie; Chen Ke; Zhu Xiao-Hong; Wang Ping; Zeng Guang; Zheng Dong-Ning; Li Lin

doi:10.7498/aps.52.2601

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Chen Ying-Fei, Peng Wei, Li Jie, Chen Ke, Zhu Xiao-Hong, Wang Ping, Zeng Guang, Zheng Dong-Ning, Li Lin. In-situ monitoring of the growth of oxide thin films in PLD using high-pressure reflection high energy electron diffractionJ. Acta Physica Sinica, 2003, 52(10): 2601-2606. DOI: 10.7498/aps.52.2601

Citation:

Chen Ying-Fei, Peng Wei, Li Jie, Chen Ke, Zhu Xiao-Hong, Wang Ping, Zeng Guang, Zheng Dong-Ning, Li Lin. In-situ monitoring of the growth of oxide thin films in PLD using high-pressure reflection high energy electron diffractionJ. Acta Physica Sinica, 2003, 52(10): 2601-2606. DOI: 10.7498/aps.52.2601

Citation:

Chen Ying-Fei, Peng Wei, Li Jie, Chen Ke, Zhu Xiao-Hong, Wang Ping, Zeng Guang, Zheng Dong-Ning, Li Lin. In-situ monitoring of the growth of oxide thin films in PLD using high-pressure reflection high energy electron diffractionJ. Acta Physica Sinica, 2003, 52(10): 2601-2606. DOI: 10.7498/aps.52.2601