Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVD

Yang Hui-Dong; Wu Chun-Ｙa; Zhao Ying; Xue Jun-Ｍing; Geng Xin-Ｈua; Xiong Shao-Ｚhen

doi:10.7498/aps.52.2865

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Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen. Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVDJ. Acta Physica Sinica, 2003, 52(11): 2865-2869. DOI: 10.7498/aps.52.2865

Citation:

Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen. Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVDJ. Acta Physica Sinica, 2003, 52(11): 2865-2869. DOI: 10.7498/aps.52.2865

Citation:

Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen. Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVDJ. Acta Physica Sinica, 2003, 52(11): 2865-2869. DOI: 10.7498/aps.52.2865