Lin Xuan-Ying, Huang Chuang-Jun, Lin Kui-Xun, Yu Yun-Peng, Yu Chu-Ying, Huang Rui. Raman analysis of microstructure of polycrystalline silicon films deposited at low-temperatures from SiCl4-H2J. Acta Physica Sinica, 2004, 53(5): 1558-1561. DOI: 10.7498/aps.53.1558
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Citation:
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Lin Xuan-Ying, Huang Chuang-Jun, Lin Kui-Xun, Yu Yun-Peng, Yu Chu-Ying, Huang Rui. Raman analysis of microstructure of polycrystalline silicon films deposited at low-temperatures from SiCl4-H2J. Acta Physica Sinica, 2004, 53(5): 1558-1561. DOI: 10.7498/aps.53.1558
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Lin Xuan-Ying, Huang Chuang-Jun, Lin Kui-Xun, Yu Yun-Peng, Yu Chu-Ying, Huang Rui. Raman analysis of microstructure of polycrystalline silicon films deposited at low-temperatures from SiCl4-H2J. Acta Physica Sinica, 2004, 53(5): 1558-1561. DOI: 10.7498/aps.53.1558
|
Citation:
|
Lin Xuan-Ying, Huang Chuang-Jun, Lin Kui-Xun, Yu Yun-Peng, Yu Chu-Ying, Huang Rui. Raman analysis of microstructure of polycrystalline silicon films deposited at low-temperatures from SiCl4-H2J. Acta Physica Sinica, 2004, 53(5): 1558-1561. DOI: 10.7498/aps.53.1558
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