Hu Yue-Hui, Yin Sheng-Yi, Chen Guang-Hua, Wu Yue-Ying, Zhou Xiao-Ming, Zhou Jian-Er, Wang Qing, Zhang Wen-Li. Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma systemJ. Acta Physica Sinica, 2004, 53(7): 2263-2269. DOI: 10.7498/aps.53.2263
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Citation:
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Hu Yue-Hui, Yin Sheng-Yi, Chen Guang-Hua, Wu Yue-Ying, Zhou Xiao-Ming, Zhou Jian-Er, Wang Qing, Zhang Wen-Li. Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma systemJ. Acta Physica Sinica, 2004, 53(7): 2263-2269. DOI: 10.7498/aps.53.2263
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Hu Yue-Hui, Yin Sheng-Yi, Chen Guang-Hua, Wu Yue-Ying, Zhou Xiao-Ming, Zhou Jian-Er, Wang Qing, Zhang Wen-Li. Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma systemJ. Acta Physica Sinica, 2004, 53(7): 2263-2269. DOI: 10.7498/aps.53.2263
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Citation:
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Hu Yue-Hui, Yin Sheng-Yi, Chen Guang-Hua, Wu Yue-Ying, Zhou Xiao-Ming, Zhou Jian-Er, Wang Qing, Zhang Wen-Li. Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma systemJ. Acta Physica Sinica, 2004, 53(7): 2263-2269. DOI: 10.7498/aps.53.2263
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