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中国物理学会期刊
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Wang Yuan, Bai Xuan-Yu, Xu Ke-Wei. Morphological characterization and nanoindentation hardness scatter evaluation for Cu-W thin films based on wavelet transformJ. Acta Physica Sinica, 2004, 53(7): 2281-2286. DOI: 10.7498/aps.53.2281
Citation: Wang Yuan, Bai Xuan-Yu, Xu Ke-Wei. Morphological characterization and nanoindentation hardness scatter evaluation for Cu-W thin films based on wavelet transformJ. Acta Physica Sinica, 2004, 53(7): 2281-2286. DOI: 10.7498/aps.53.2281
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Morphological characterization and nanoindentation hardness scatter evaluation for Cu-W thin films based on wavelet transform

Acta Phys. Sin., 2004, 53(7): 2281-2286.
DOI: 10.7498/aps.53.2281
CSTR: 32037.14.aps.53.2281
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