The influence of the magnetic field magnetron under the substrate on the sputtering glow and film thickness gradient

Zhao Xin-Min; Di Guo-Qing

doi:10.7498/aps.53.306

Search

x

Zhao Xin-Min, Di Guo-Qing. The influence of the magnetic field magnetron under the substrate on the sputtering glow and film thickness gradientJ. Acta Physica Sinica, 2004, 53(1): 306-310. DOI: 10.7498/aps.53.306

Citation:

Zhao Xin-Min, Di Guo-Qing. The influence of the magnetic field magnetron under the substrate on the sputtering glow and film thickness gradientJ. Acta Physica Sinica, 2004, 53(1): 306-310. DOI: 10.7498/aps.53.306

Citation:

Zhao Xin-Min, Di Guo-Qing. The influence of the magnetic field magnetron under the substrate on the sputtering glow and film thickness gradientJ. Acta Physica Sinica, 2004, 53(1): 306-310. DOI: 10.7498/aps.53.306