Search

x
中国物理学会期刊
Advanced Search
Huang Wei, Zhang Li-Chun, Gao Yu-Zhi, Jin Hai-Yan. The improvement of thermal stability in NiSi film by adding MoJ. Acta Physica Sinica, 2005, 54(5): 2252-2255. DOI: 10.7498/aps.54.2252
Citation: Huang Wei, Zhang Li-Chun, Gao Yu-Zhi, Jin Hai-Yan. The improvement of thermal stability in NiSi film by adding MoJ. Acta Physica Sinica, 2005, 54(5): 2252-2255. DOI: 10.7498/aps.54.2252
shu

The improvement of thermal stability in NiSi film by adding Mo

Acta Phys. Sin., 2005, 54(5): 2252-2255.
DOI: 10.7498/aps.54.2252
CSTR: 32037.14.aps.54.2252
PDF
导出引用

  • Abstract

    Authors and contacts

    References

Turn off MathJax
Article Contents

Catalog

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return