Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVD

Wang Xiao-Qiang; Li Jun-Shuai; Chen Qiang; Qi Jing; Yin Min; He De-Yan

doi:10.7498/aps.54.269

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Wang Xiao-Qiang, Li Jun-Shuai, Chen Qiang, Qi Jing, Yin Min, He De-Yan. Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVDJ. Acta Physica Sinica, 2005, 54(1): 269-273. DOI: 10.7498/aps.54.269

Citation:

Wang Xiao-Qiang, Li Jun-Shuai, Chen Qiang, Qi Jing, Yin Min, He De-Yan. Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVDJ. Acta Physica Sinica, 2005, 54(1): 269-273. DOI: 10.7498/aps.54.269

Citation:

Wang Xiao-Qiang, Li Jun-Shuai, Chen Qiang, Qi Jing, Yin Min, He De-Yan. Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVDJ. Acta Physica Sinica, 2005, 54(1): 269-273. DOI: 10.7498/aps.54.269