A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVD

Zhang Xiao-Dan; Zhao Ying; Zhu Feng; Wei Chang-Chun; Wu Chun-Ya; Gao Yan-Tao; Hou Guo-Fu; Sun Jian; Geng Xin-Hua; Xiong Shao-Zhen

doi:10.7498/aps.54.445

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Zhang Xiao-Dan, Zhao Ying, Zhu Feng, Wei Chang-Chun, Wu Chun-Ya, Gao Yan-Tao, Hou Guo-Fu, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen. A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVDJ. Acta Physica Sinica, 2005, 54(1): 445-449. DOI: 10.7498/aps.54.445

Citation:

Zhang Xiao-Dan, Zhao Ying, Zhu Feng, Wei Chang-Chun, Wu Chun-Ya, Gao Yan-Tao, Hou Guo-Fu, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen. A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVDJ. Acta Physica Sinica, 2005, 54(1): 445-449. DOI: 10.7498/aps.54.445

Citation:

Zhang Xiao-Dan, Zhao Ying, Zhu Feng, Wei Chang-Chun, Wu Chun-Ya, Gao Yan-Tao, Hou Guo-Fu, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen. A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVDJ. Acta Physica Sinica, 2005, 54(1): 445-449. DOI: 10.7498/aps.54.445