Characterization of silicon nitride films prepared by MW-ECR magnetron sputtering

Ding Wan-Yu; Xu Jun; Li Yan-Qin; Piao Yong; Gao Peng; Deng Xin-Lü; Dong Chuang

doi:10.7498/aps.55.1363

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Ding Wan-Yu, Xu Jun, Li Yan-Qin, Piao Yong, Gao Peng, Deng Xin-Lü, Dong Chuang. Characterization of silicon nitride films prepared by MW-ECR magnetron sputteringJ. Acta Physica Sinica, 2006, 55(3): 1363-1368. DOI: 10.7498/aps.55.1363

Citation:

Ding Wan-Yu, Xu Jun, Li Yan-Qin, Piao Yong, Gao Peng, Deng Xin-Lü, Dong Chuang. Characterization of silicon nitride films prepared by MW-ECR magnetron sputteringJ. Acta Physica Sinica, 2006, 55(3): 1363-1368. DOI: 10.7498/aps.55.1363

Citation:

Ding Wan-Yu, Xu Jun, Li Yan-Qin, Piao Yong, Gao Peng, Deng Xin-Lü, Dong Chuang. Characterization of silicon nitride films prepared by MW-ECR magnetron sputteringJ. Acta Physica Sinica, 2006, 55(3): 1363-1368. DOI: 10.7498/aps.55.1363