Effect of excitation frequency on microcrystalline silicon materials prepared by  VHF-PECVD

Gao Yan-Tao; Zhang Xiao-Dan; Zhao Ying; Sun Jian; Zhu Feng; Wei Chang-Chun

doi:10.7498/aps.55.1497

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Gao Yan-Tao, Zhang Xiao-Dan, Zhao Ying, Sun Jian, Zhu Feng, Wei Chang-Chun. Effect of excitation frequency on microcrystalline silicon materials prepared by VHF-PECVDJ. Acta Physica Sinica, 2006, 55(3): 1497-1501. DOI: 10.7498/aps.55.1497

Citation:

Gao Yan-Tao, Zhang Xiao-Dan, Zhao Ying, Sun Jian, Zhu Feng, Wei Chang-Chun. Effect of excitation frequency on microcrystalline silicon materials prepared by VHF-PECVDJ. Acta Physica Sinica, 2006, 55(3): 1497-1501. DOI: 10.7498/aps.55.1497

Citation:

Gao Yan-Tao, Zhang Xiao-Dan, Zhao Ying, Sun Jian, Zhu Feng, Wei Chang-Chun. Effect of excitation frequency on microcrystalline silicon materials prepared by VHF-PECVDJ. Acta Physica Sinica, 2006, 55(3): 1497-1501. DOI: 10.7498/aps.55.1497