Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu. Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasmaJ. Acta Physica Sinica, 2006, 55(5): 2606-2612. DOI: 10.7498/aps.55.2606
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Citation:
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Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu. Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasmaJ. Acta Physica Sinica, 2006, 55(5): 2606-2612. DOI: 10.7498/aps.55.2606
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Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu. Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasmaJ. Acta Physica Sinica, 2006, 55(5): 2606-2612. DOI: 10.7498/aps.55.2606
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Citation:
|
Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu. Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasmaJ. Acta Physica Sinica, 2006, 55(5): 2606-2612. DOI: 10.7498/aps.55.2606
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