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Properties of Co nano-films deposited on monocrystalline silicon surface by ion beam sputteringJ. Acta Physica Sinica, 2007, 56(12): 7158-7164. DOI: 10.7498/aps.56.7158
Citation: Properties of Co nano-films deposited on monocrystalline silicon surface by ion beam sputteringJ. Acta Physica Sinica, 2007, 56(12): 7158-7164. DOI: 10.7498/aps.56.7158
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Properties of Co nano-films deposited on monocrystalline silicon surface by ion beam sputtering

Acta Phys. Sin., 2007, 56(12): 7158-7164.
DOI: 10.7498/aps.56.7158
CSTR: 32037.14.aps.56.7158
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