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The effect of pressure on growth rate and quality of diamond films prepared by microwave plasma chemical vapor depositionJ. Acta Physica Sinica, 2007, 56(12): 7183-7187. DOI: 10.7498/aps.56.7183
Citation: The effect of pressure on growth rate and quality of diamond films prepared by microwave plasma chemical vapor depositionJ. Acta Physica Sinica, 2007, 56(12): 7183-7187. DOI: 10.7498/aps.56.7183
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The effect of pressure on growth rate and quality of diamond films prepared by microwave plasma chemical vapor deposition

Acta Phys. Sin., 2007, 56(12): 7183-7187.
DOI: 10.7498/aps.56.7183
CSTR: 32037.14.aps.56.7183
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