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The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputteringJ. Acta Physica Sinica, 2007, 56(12): 7255-7261. DOI: 10.7498/aps.56.7255
Citation: The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputteringJ. Acta Physica Sinica, 2007, 56(12): 7255-7261. DOI: 10.7498/aps.56.7255
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The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering

Acta Phys. Sin., 2007, 56(12): 7255-7261.
DOI: 10.7498/aps.56.7255
CSTR: 32037.14.aps.56.7255
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