Study on the optical and electrical properties of plasma for the deposition of microcrystalline silicon

Zhang Fa-Rong; Zhang Xiao-Dan; Amanatides E.; Mataras D.; Zhao Jing; Zhao Ying

doi:10.7498/aps.57.3022

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Zhang Fa-Rong, Zhang Xiao-Dan, Amanatides E., Mataras D., Zhao Jing, Zhao Ying. Study on the optical and electrical properties of plasma for the deposition of microcrystalline siliconJ. Acta Physica Sinica, 2008, 57(5): 3022-3026. DOI: 10.7498/aps.57.3022

Citation:

Zhang Fa-Rong, Zhang Xiao-Dan, Amanatides E., Mataras D., Zhao Jing, Zhao Ying. Study on the optical and electrical properties of plasma for the deposition of microcrystalline siliconJ. Acta Physica Sinica, 2008, 57(5): 3022-3026. DOI: 10.7498/aps.57.3022

Citation:

Zhang Fa-Rong, Zhang Xiao-Dan, Amanatides E., Mataras D., Zhao Jing, Zhao Ying. Study on the optical and electrical properties of plasma for the deposition of microcrystalline siliconJ. Acta Physica Sinica, 2008, 57(5): 3022-3026. DOI: 10.7498/aps.57.3022