Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing silicon films

Chen Fei; Zhang Xiao-Dan; Zhao Ying; Wei Chang-Chun; Sun Jian

doi:10.7498/aps.57.3276

Search

x

Chen Fei, Zhang Xiao-Dan, Zhao Ying, Wei Chang-Chun, Sun Jian. Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing silicon filmsJ. Acta Physica Sinica, 2008, 57(5): 3276-3280. DOI: 10.7498/aps.57.3276

Citation:

Chen Fei, Zhang Xiao-Dan, Zhao Ying, Wei Chang-Chun, Sun Jian. Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing silicon filmsJ. Acta Physica Sinica, 2008, 57(5): 3276-3280. DOI: 10.7498/aps.57.3276

Citation:

Chen Fei, Zhang Xiao-Dan, Zhao Ying, Wei Chang-Chun, Sun Jian. Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing silicon filmsJ. Acta Physica Sinica, 2008, 57(5): 3276-3280. DOI: 10.7498/aps.57.3276