Thermal stability of structure and properties of CHx doped SiCOH low dielectric constant films

Du Jie; Ye Chao; Yu Xiao-Zhu; Zhang Hai-Yan; Ning Zhao-Yuan

doi:10.7498/aps.58.575

Search

x

Du Jie, Ye Chao, Yu Xiao-Zhu, Zhang Hai-Yan, Ning Zhao-Yuan. Thermal stability of structure and properties of CHx doped SiCOH low dielectric constant filmsJ. Acta Physica Sinica, 2009, 58(1): 575-579. DOI: 10.7498/aps.58.575

Citation:

Du Jie, Ye Chao, Yu Xiao-Zhu, Zhang Hai-Yan, Ning Zhao-Yuan. Thermal stability of structure and properties of CHx doped SiCOH low dielectric constant filmsJ. Acta Physica Sinica, 2009, 58(1): 575-579. DOI: 10.7498/aps.58.575

Citation:

Du Jie, Ye Chao, Yu Xiao-Zhu, Zhang Hai-Yan, Ning Zhao-Yuan. Thermal stability of structure and properties of CHx doped SiCOH low dielectric constant filmsJ. Acta Physica Sinica, 2009, 58(1): 575-579. DOI: 10.7498/aps.58.575