Influence of the ambient pressure of Ar on the range of nucleation area of Si nanoparticles

Chu Li-Zhi; Deng Ze-Chao; Ding Xue-Cheng; Zhao Hong-Dong; Wang Ying-Long; Fu Guang-Sheng

doi:10.7498/aps.61.108102

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Chu Li-Zhi, Deng Ze-Chao, Ding Xue-Cheng, Zhao Hong-Dong, Wang Ying-Long, Fu Guang-Sheng. Influence of the ambient pressure of Ar on the range of nucleation area of Si nanoparticlesJ. Acta Physica Sinica, 2012, 61(10): 108102. DOI: 10.7498/aps.61.108102

Citation:

Chu Li-Zhi, Deng Ze-Chao, Ding Xue-Cheng, Zhao Hong-Dong, Wang Ying-Long, Fu Guang-Sheng. Influence of the ambient pressure of Ar on the range of nucleation area of Si nanoparticlesJ. Acta Physica Sinica, 2012, 61(10): 108102. DOI: 10.7498/aps.61.108102

Citation:

Chu Li-Zhi, Deng Ze-Chao, Ding Xue-Cheng, Zhao Hong-Dong, Wang Ying-Long, Fu Guang-Sheng. Influence of the ambient pressure of Ar on the range of nucleation area of Si nanoparticlesJ. Acta Physica Sinica, 2012, 61(10): 108102. DOI: 10.7498/aps.61.108102